Study of Bi-layer Silylation Process for 193 nm Lithography.
نویسندگان
چکیده
منابع مشابه
TiSi-nitride attenuating phase-shift photomask for 193 nm lithography
G. A. M. Reynolds, R. H. French, P. F. Carcia, C. C. Torardi, G. Hughes, D. J. Jones, M. F. Lemon, M. Reilly, L. Wilson, C. R. Miao “TiSi-nitride attenuating phase-shift photomask for 193 nm lithography”, 18th Annual BACUS Symposium on Photomask Technology and Management, SPIE Vol. 3546, Edited by B. J. Grenon, F. E. Abboud, 514-23, (1998). TiSi-nitride attenuating phase-shift photomask for 193...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 1999
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.12.687